David H. Wang is the Chief Executive Officer and President of ACM Research, Inc. (Class A), a leading company in the semiconductor industry that specializes in developing and supplying advanced wafer processing solutions. With a strong background in engineering and technology, Wang has been instrumental in guiding ACM Research towards significant growth and innovation. He co-founded the company in 1998 and has since played a pivotal role in shaping its strategic direction and technological advancements. Before founding ACM Research, Wang accumulated extensive experience in the semiconductor field. He earned his Ph.D. in chemistry from Columbia University and held various technical and leadership positions at companies such as Applied Materials and Mattson Technology. His expertise in chemical processes and equipment design has been crucial in developing ACM Research's cutting-edge technologies, including single-wafer cleaning and electrochemical plating solutions. Under his leadership, ACM Research has successfully expanded its global footprint, establishing a strong presence in key markets such as China, the United States, and Europe. As CEO and President, David H. Wang continues to drive ACM Research's mission to deliver innovative solutions that enhance semiconductor manufacturing processes. His vision for the company focuses on maintaining a competitive edge through continuous research and development, as well as fostering strategic partnerships within the industry. Wang's leadership has been recognized with numerous awards and accolades, reflecting his significant contributions to the field of semiconductor technology and his role in positioning ACM Research as a leader in the global market.